Three-Terminal MOS Structure

Lecture 6-1 · Al gate / SiO2 (tox = 10 nm) / p-Si (Na = 1017 cm−3) with an n+ region S (future source) · T = 300 K —

Device and circuit

⊖ ionized acceptor · ▬ inversion electrons (density ∝ |Q′n|) · + gate charge

Barrier along the surface (n+ → p)

Grey: the same φs with VSB = 0. Barrier for electrons = e(Vbi + VSB − φs).

Readout

VGBVSB
VGS = VGB − VSBφs
φs − VSBnsurface
Q′nQ′dep
xd (gate)barrier
VLB (φs = φfp+VSB)VMB (φs = 2φfp+VSB)
Mode: —
nsurface = Na exp{e[φs − (2φfp + VSB)]/kT}: what counts is φs − VSB, not φs itself.

Energy bands vs. depth

EFp stays at its bulk value; EFn is set by the n+ region (lowered by eVSB). Depletion approximation, not to scale.

Plots vs. VGB

Solid: present VSB; dashed: VSB = 0 (two-terminal). ● = present bias.

Controls

Connect
Steps
Animate
What to notice
  1. (a)→(b): raising VGB lowers the barrier from n+; electrons flow in and the surface inverts.
  2. (b)→(c): VSB lowers Ec of n+ by eVSB; the barrier grows and the inversion layer thins.
  3. (c)→(d): raising φs by VSB restores the same barrier and the same nsurface.
  4. In the plots every curve moves right with VSB; on the deep-depletion line VSB has no effect.
  5. Common-S: holding VGS and raising VSB reduces |Q′n| (the body effect).
Charge-sheet model with the exact Q′s(φs, VSB); VFB = −0.70 V, γ = 0.53 V1/2, Vbi(n+p) = 0.99 V. Small reverse currents are neglected.